Active solid-state devices (e.g. – transistors – solid-state diode – Incoherent light emitter structure – With housing or contact structure
Reexamination Certificate
2011-08-30
2011-08-30
Dickey, Thomas L (Department: 2893)
Active solid-state devices (e.g., transistors, solid-state diode
Incoherent light emitter structure
With housing or contact structure
C257SE33058
Reexamination Certificate
active
08008682
ABSTRACT:
An alumina substrate and method of making an alumina substrate using oxidation is provided. Generally, photoresist masks are used to protect selected areas of an aluminum layer. The unprotected or exposed areas of the aluminum layer are then oxidized during a photolithography process. The protected, unexposed areas of the aluminum layer retain their conductive properties while the oxidized areas are converted to alumina, or aluminum oxide, which is non-conductive. Accordingly, an alumina substrate having conductive areas of aluminum is formed. In one embodiment, the alumina substrate includes an alumina layer, one or more aluminum vias formed within the alumina layer, each of the one or more aluminum vias extending between the bottom of the alumina layer and the top of the alumina layer, wherein the one or more aluminum vias are integrally formed within the alumina layer.
REFERENCES:
patent: 6528732 (2003-03-01), Okubora et al.
patent: 6670704 (2003-12-01), Neftin et al.
patent: 2002/0012780 (2002-01-01), Yuyama et al.
patent: 2004/0178000 (2004-09-01), Tseng
patent: 2005/0225222 (2005-10-01), Mazzochette et al.
patent: 2006/0057866 (2006-03-01), Mirsky et al.
patent: 2006/0097385 (2006-05-01), Negley
patent: 2007/0080360 (2007-04-01), Mirsky et al.
patent: 2007/0262470 (2007-11-01), Ichiryu et al.
AZOM AI alloy, 2007, http://www.azom.com/details.asp?ArticleID=310).
Liaw Been Yu
Lu Ming
Dickey Thomas L
Hong Kong Applied Science and Technology Research Institute Co.
Kaminski Jeffri A.
Venable LLP
Yushin Nikolay
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