Alumina material useful with thin film heads

Details Alumina material useful with thin film heads Alumina material useful with thin film heads

1991-10-31

1993-10-26

Weisstuch, Aaron

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

20419222, C23C 1434

Patent

active

052562662

ABSTRACT:
A process for sputtering and depositing sputtered alumina uses a mixture of two gases, preferably argon and air, for the deposition phase. No external heat is supplied to the sputtering system during the presputtering, sputter etch and deposition phases of the process. The alumina that is produced is crypto-crystalline and is characterized by crystal size of less than one micron. The alumina is very hard, impervious to attack by acid or base solutions, and has improved machining qualities. The alumina is useful as a transducing gap layer in a thin film magnetic head.

REFERENCES:
patent: 4790920 (1988-12-01), Krzanich
patent: 4875987 (1989-10-01), Wada et al.

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