Alumina layer with controlled texture

Details Alumina layer with controlled texture Alumina layer with controlled texture

2005-11-02

2008-10-28

Turner, Archene (Department: 1794)

Stock material or miscellaneous articles

Structurally defined web or sheet

Including components having same physical characteristic in...

C051S307000, C051S309000, C428S336000, C428S697000, C428S698000, C428S699000, C428S701000, C428S702000

Reexamination Certificate

active

07442432

ABSTRACT:
A new and refined method to produce α-Al2O3layers in a temperature range of from about 750 to about 1000° C. with a controlled growth texture and substantially enhanced wear resistance and toughness than the prior art is disclosed. The α-Al2O3layer of the present invention is formed on a bonding layer of (Ti,Al)(C,O,N) with increasing aluminium content towards the outer surface. Nucleation of α-Al2O3is obtained through a nucleation step being composed of short pulses and purges consisting of Ti/Al-containing pulses and oxidising pulses. The α-Al2O3layer according to the present invention has a thickness ranging from about 1 to about 20 μm and is composed of columnar grains. The length/width ratio of the alumina grains is from about 2 to about 12, preferably from about 4 to about 8. The layer is characterized by a strong (104) growth texture, measured using XRD, and by low intensity of (012), (110), (113), (024) and (116) diffraction peaks.

REFERENCES:
patent: 5137774 (1992-08-01), Ruppi
patent: 5654035 (1997-08-01), Ljungberg et al.
patent: 5766782 (1998-06-01), Ljungberg
patent: 5851687 (1998-12-01), Ljungberg
patent: 5861210 (1999-01-01), Lenander et al.
patent: 5863640 (1999-01-01), Ljungberg et al.
patent: 5980988 (1999-11-01), Ljungberg
patent: 6293739 (2001-09-01), Uchino et al.
patent: 6333098 (2001-12-01), Olsson et al.
patent: 6333103 (2001-12-01), Ishii et al.
patent: 6337152 (2002-01-01), Kukino et al.
patent: 6436519 (2002-08-01), Holzschuh
patent: 6572991 (2003-06-01), Ruppi
patent: 7163735 (2007-01-01), Ruppi
patent: 2001/0006724 (2001-07-01), Holzchuh
patent: 2002/0155325 (2002-10-01), Martensson
patent: 2004/0028951 (2004-02-01), Ruppi
patent: 2006/0115662 (2006-06-01), Ruppi
patent: 2006/0141271 (2006-06-01), Ruppi
patent: 0 693 574 (1995-07-01), None
patent: 502 174 (1995-09-01), None
patent: 502 223 (1995-09-01), None
patent: 525 581 (2005-03-01), None
patent: 95/19457 (1995-07-01), None
patent: 98/10119 (1998-03-01), None
Jae-Gon Kim et al. “Effect of Partial Pressure of the Reactant Gas on the Chemical Vapour Deposition of Al2O3.”Thin Solid Films. vol. 97, No. 1, Nov. 5, 1982, pp. 97-106.
Yashar Yourdshahyan et al. “Theoretical Structure Determination of a complex Material:k-Al2O3.” Journal of the American Ceramic Society, vol. 82, No. 6, pp. 1365-1379, 1999.

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