Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2005-01-25
2005-01-25
Rosasco, S. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C716S030000
Reexamination Certificate
active
06846596
ABSTRACT:
A method and system produce alternating phase shift masks using multiple phase shift mask resolution levels for multiple feature classes. In one method, a pattern for a photolithographic mask that defines a layer is processed, The pattern defines features in multiple feature classes in the layer. For various feature resolution levels, layout dimensions for phase shift windows pairs are defined. The phase shift windows pairs are laid out with the layout dimensions. Phase shift values are assigned to the phase shift windows.
REFERENCES:
patent: 6420074 (2002-07-01), Wang et al.
patent: 6436590 (2002-08-01), Wang et al.
patent: 6584610 (2003-06-01), Wu et al.
patent: 20020083410 (2002-06-01), Wa et al.
patent: 20020127479 (2002-09-01), Pierrat
patent: 20020129327 (2002-09-01), Pierrat et al.
patent: 20020152454 (2002-10-01), Cote et al.
patent: 20020155363 (2002-10-01), Cote et al.
patent: WO 02073312 (2002-09-01), None
Cooke, M., “OPC PSM Designs for Poly Gate Layers”, European Semiconductor, vol. 22, No. 7, pp. 57-59, Jul. 2000.
Granik, Y., et al., “Sub-Resolution Process Windows And Yield Estimation Technique Based On Detailed Full-Chip CD Simulation”, SPIE, vol. 4182, pp 335-341 (2000).
Plat, M., et al., “The Impact of Optical Enhancement Techniques on the Mask Error Enhancement Funchtion (MEEF)”, SPIE, vol. 4000, pp. 206-214, Mar. 1-3, 2000.
Mansuripur, M., et al., “Projection Photolithography”, Optics & Photonics News 11, 17 pages, Feb. 2000.
Haynes Beffel & Wolfeld LLP
Numerical Technologies Inc.
Rosasco S.
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