Alternating phase shift masking for multiple levels of...

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C716S030000

Reexamination Certificate

active

06846596

ABSTRACT:
A method and system produce alternating phase shift masks using multiple phase shift mask resolution levels for multiple feature classes. In one method, a pattern for a photolithographic mask that defines a layer is processed, The pattern defines features in multiple feature classes in the layer. For various feature resolution levels, layout dimensions for phase shift windows pairs are defined. The phase shift windows pairs are laid out with the layout dimensions. Phase shift values are assigned to the phase shift windows.

REFERENCES:
patent: 6420074 (2002-07-01), Wang et al.
patent: 6436590 (2002-08-01), Wang et al.
patent: 6584610 (2003-06-01), Wu et al.
patent: 20020083410 (2002-06-01), Wa et al.
patent: 20020127479 (2002-09-01), Pierrat
patent: 20020129327 (2002-09-01), Pierrat et al.
patent: 20020152454 (2002-10-01), Cote et al.
patent: 20020155363 (2002-10-01), Cote et al.
patent: WO 02073312 (2002-09-01), None
Cooke, M., “OPC PSM Designs for Poly Gate Layers”, European Semiconductor, vol. 22, No. 7, pp. 57-59, Jul. 2000.
Granik, Y., et al., “Sub-Resolution Process Windows And Yield Estimation Technique Based On Detailed Full-Chip CD Simulation”, SPIE, vol. 4182, pp 335-341 (2000).
Plat, M., et al., “The Impact of Optical Enhancement Techniques on the Mask Error Enhancement Funchtion (MEEF)”, SPIE, vol. 4000, pp. 206-214, Mar. 1-3, 2000.
Mansuripur, M., et al., “Projection Photolithography”, Optics & Photonics News 11, 17 pages, Feb. 2000.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Alternating phase shift masking for multiple levels of... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Alternating phase shift masking for multiple levels of..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Alternating phase shift masking for multiple levels of... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3424522

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.