Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2005-12-20
2005-12-20
Rosasco, S. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C430S394000
Reexamination Certificate
active
06977127
ABSTRACT:
An alternating phase shift mask. The alternating phase shift mask includes a transparent substrate, a light-shielding layer disposed on the transparent substrate to define a transparent array consisting of a plurality of first phase rows and a plurality of second phase rows alternately interposed between the first phase rows. The alternating phase shift mask further comprises a phase interference enhancement feature disposed a predetermined distance from the outermost row of the transparent array, wherein the phases of the phase interference enhancement feature and the outermost row are reverse.
REFERENCES:
patent: 6440614 (2002-08-01), Sonoda
patent: 2003/0203291 (2003-10-01), Misaka
patent: 07-013326 (1995-01-01), None
patent: 07-230160 (1995-08-01), None
Hsu Yi-Yu
Liao Hung-Yueh
Shiah Chii-Ming
Tsai Kao-Tsai
Tung Yu-Cheng
Birch & Stewart Kolasch & Birch, LLP
Rosasco S.
Winbond Electronics Corp.
LandOfFree
Alternating phase shift mask does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Alternating phase shift mask, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Alternating phase shift mask will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3510364