Alternate side lithographic substrate imaging

Radiation imagery chemistry: process – composition – or product th – Registration or layout process other than color proofing

Reexamination Certificate

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Details

C430S313000, C430S311000

Reexamination Certificate

active

07320847

ABSTRACT:
A device manufacturing method capable of imaging structures on one side of a substrate aligned to markers on the other side, is presented herein. One embodiment of the present invention comprises providing a first substrate having first and second surfaces, patterning the first surface of the substrate with at least one reversed alignment marker, providing a protective layer over the alignment marker, and bonding the first surface of the first substrate to a second substrate. The embodiment further includes locally etching the first substrate as far as the protective layer to form a trench around the reversed alignment marker, and forming at least one patterned layer on the second surface using a lithographic projection apparatus having a front-to-backside alignment system while aligning the substrate to the alignment markers revealed in each trench.

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patent: 5436173 (1995-07-01), Houston
patent: 6180498 (2001-01-01), Geffken et al.
patent: 6335214 (2002-01-01), Fung
patent: 2002/0109825 (2002-08-01), Gui et al.
patent: 0 513 684 (1992-11-01), None
patent: 08-153676 (1996-06-01), None
patent: 2000-232044 (2000-08-01), None
patent: WO 01/82370 (2001-11-01), None
European Search Report for EP 03 25 7168 completed Mar. 29, 2004.

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