Altering pattern data based on measured optical element...

Photocopying – Projection printing and copying cameras – Illumination systems or details

Reexamination Certificate

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C355S052000

Reexamination Certificate

active

07936445

ABSTRACT:
A system and method are used to compensate for distortions or aberrations in an image formed in a projection system. Pattern data is generated corresponding to features to be formed on a substrate. At least one of aberrations and distortions of a projection optical system are measured. The pattern data is altered based on the measuring step. The altered pattern data is transmitted to a patterning device to control individually controllable elements coupled to the patterning device. Non uniformities in one or both of a field and pupil of an illumination system can also be measured and used to alter the pattern data.

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Notification of Reasons for Refusal mailed Sep. 7, 2010 for Japanese Patent Application No. 2007-160009, 3 pgs.

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