Alpha-resorcyclic acid ester derivatives and recording materials

Coating processes – Direct application of electrical – magnetic – wave – or... – Polymerization of coating utilizing direct application of...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

3461503, 560 70, C08J 718, C07C 6988

Patent

active

056933746

ABSTRACT:
.alpha.-resorcylic acid ester derivatives useful as electron-accepting compounds for recording materials, and highly durable recording materials containing these derivatives. The .alpha.-resorcylic acid derivative is represented by the following general formula (I), ##STR1## wherein R.sub.1 represents a hydrogen atom, a halogen atom or an alkyl group, and X represents a divalent group.

REFERENCES:
patent: 4446209 (1984-05-01), Iwakura et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Alpha-resorcyclic acid ester derivatives and recording materials does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Alpha-resorcyclic acid ester derivatives and recording materials, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Alpha-resorcyclic acid ester derivatives and recording materials will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-799451

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.