Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1988-09-22
1992-10-27
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430166, 430189, 430272, 430313, 430193, 534556, G03F 7023, G03F 7075, G03F 736
Patent
active
051588552
ABSTRACT:
An .alpha.-diazoacetoacetic acid ester derived from cholic acid, deoxycholic acid, lithocholic acid or a derivative thereof is effective as a sensitizer in a photosensitive resin composition containing an alkali-soluble resin to form a resist for lithography using KrF excimer laser.
REFERENCES:
patent: 4339522 (1982-07-01), Balanson et al.
patent: 4400461 (1983-08-01), Chandross et al.
patent: 4622283 (1986-11-01), Gray
patent: 4624908 (1986-11-01), Schwartzkopf
patent: 4626491 (1986-12-01), Gray
Willson, C. Grant et al., "New Diazoketone Dissolution Inhibitors for Deep UV Photolithography", SPIE vol. 771 Advances in Resist Techl. & Proc., 1987, pp. 2-10.
IEEE Transactions on Electron Devices, vol. ED-28, No. 11 pp. 1300-1305 (1981).
Ebata Keisuke
Mizushima Akiko
Nate Kazuo
Sugiyama Hisashi
Bowers Jr. Charles L.
Chu John S.
Hitachi , Ltd.
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