Radiation imagery chemistry: process – composition – or product th – Electric or magnetic imagery – e.g. – xerography,... – Radiation-sensitive composition or product
Patent
1998-12-22
1999-12-21
Martin, Roland
Radiation imagery chemistry: process, composition, or product th
Electric or magnetic imagery, e.g., xerography,...
Radiation-sensitive composition or product
430 583, 430 596, 430132, G03G 5047
Patent
active
060047097
ABSTRACT:
An allyloxymethylatedpolyamide composition is disclosed, the allyloxymethylatedpolyamide being represented by Formulae I and II: ##STR1## wherein: n is a positive integer sufficient to achieve a weight average molecular weight between about 5000 and about 100,000,
REFERENCES:
patent: 4050935 (1977-09-01), Limburg et al.
patent: 4281054 (1981-07-01), Horgan et al.
patent: 4297425 (1981-10-01), Pai et al.
patent: 4457994 (1984-07-01), Pai et al.
patent: 4599286 (1986-07-01), Limburg et al.
patent: 4871634 (1989-10-01), Limburg et al.
patent: 5312708 (1994-05-01), Terrell et al.
patent: 5368967 (1994-11-01), Schank et al.
patent: 5702854 (1997-12-01), Schank et al.
DeFeo Paul J.
Fuller Timothy J.
Limburg William W.
Nolley Robert W.
Pai Damodar M.
Martin Roland
Xerox Corporation
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