Stock material or miscellaneous articles – Structurally defined web or sheet – Including components having same physical characteristic in...
Reexamination Certificate
2005-10-11
2011-10-25
Turner, Archene (Department: 1784)
Stock material or miscellaneous articles
Structurally defined web or sheet
Including components having same physical characteristic in...
C051S307000, C051S309000, C427S255120, C427S255290, C428S336000, C428S469000, C428S472000, C428S698000
Reexamination Certificate
active
08043692
ABSTRACT:
A wear-, erosion- and chemically-resistant material containing tungsten alloyed with carbon, the carbon being present in an amount of 0.01 wt % up to 0.97 wt % of the total weight, wherein the material preferably comprises a matrix of metallic tungsten with dispersed tungsten carbide nanoparticles having a particle size not greater than 50 nanometers, preferably not greater than 10 nanometers. The material is optionally also alloyed with fluorine, the fluorine being present in an amount of 0.01 wt % up to 0.4 wt % of the total weight. The material is extremely hard and tough.
REFERENCES:
patent: 3361599 (1968-01-01), Bargainnier et al.
patent: 3565676 (1971-02-01), Holzl
patent: 4053306 (1977-10-01), Rodriguez
patent: 4427445 (1984-01-01), Holzl et al.
patent: 4910091 (1990-03-01), Garg et al.
patent: 4927713 (1990-05-01), Garg et al.
patent: 4980201 (1990-12-01), Tokunaga et al.
patent: 5028756 (1991-07-01), Ezaki et al.
patent: 5041041 (1991-08-01), Passmore et al.
patent: 5064728 (1991-11-01), Sunder et al.
patent: 5372661 (1994-12-01), Felix et al.
patent: 5512240 (1996-04-01), Matusda et al.
patent: 5722036 (1998-02-01), Shikata et al.
patent: 5742891 (1998-04-01), Patrician et al.
patent: 6624557 (2003-09-01), Pyen et al.
patent: 6800383 (2004-10-01), Lakhotkin et al.
patent: 7022403 (2006-04-01), Lakhotkin et al.
patent: 2003/0132707 (2003-07-01), Meszaros et al.
patent: 1289859 (2001-04-01), None
patent: 1160638 (1964-01-01), None
patent: 0411646 (1991-02-01), None
patent: 1158070 (2001-11-01), None
patent: 1300380 (2003-04-01), None
patent: 133168 (1919-10-01), None
patent: 221786 (1925-02-01), None
patent: 387699 (1933-02-01), None
patent: 909946 (1962-11-01), None
patent: 918620 (1963-02-01), None
patent: 1051835 (1966-12-01), None
patent: 1 540 718 (1979-02-01), None
patent: 54152281 (1979-11-01), None
patent: 55024803 (1980-02-01), None
patent: 55-070501 (1980-05-01), None
patent: 03-094060 (1991-04-01), None
patent: 06-173009 (1994-06-01), None
patent: 07300648 (1995-11-01), None
patent: 5507051 (2003-04-01), None
patent: 2003129164 (2003-05-01), None
patent: 2206629 (2003-06-01), None
International Preliminary Report Application No. PCT/GB2005/003913 Apr. 20, 2006.
International Search Report Application No. PCT/GB2005/003913 Dated Apr. 20, 2006.
J.V. Festa & J.C Danko “Some Effects of Fluorine Content on the Properties of Chemically Vapor Deposited Tungsten” General Electric Company, Nuclear Thermionic Power Operation, 1967, p. 349-361.
Khusainov M.A; “Thermal Strength of Refractory Materials Produced by Chemical Vapour Deposition of Gaseous” Leningrad, Leningrad State University Publishing House, 1979, p. 160.
Lakhokin Y.V., Krasovsky A.I;“Tungsten-Rhenium Coatings”, (in Russian), Moscow, Nauka, 1989, p. 159.
Savitsky E.M., Burkhanov G.S; “Metallurgy of Refractory and Rare Metals, (in Russian) Moscow, Nauka” Publishing House 1971, p. 356.
UK Search report Application No. GB 0422608.0 dated Feb. 22, 2005.
UK Search Report Application No. GB 0520589.3 Dated Feb. 22, 2006.
Aleksandrov Sergey
Lakhotkin Yury
Zhuk Yuri
Hardide Coatings Limited
Pearl Cohen Zedek Latzer LLP
Turner Archene
LandOfFree
Alloyed tungsten produced by chemical vapour deposition does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Alloyed tungsten produced by chemical vapour deposition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Alloyed tungsten produced by chemical vapour deposition will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4284954