Electrolysis: processes – compositions used therein – and methods – Electrolytic synthesis – Utilizing fused bath
Patent
1997-07-03
2000-07-11
Gorgos, Kathryn
Electrolysis: processes, compositions used therein, and methods
Electrolytic synthesis
Utilizing fused bath
C25C 326
Patent
active
060867450
ABSTRACT:
A method of obtaining a new allotropic modification of metal zirconium and hafnium with layered structure consisting of double layered disposition of metal atoms with decreased interatomic distances in the doubled layers and increased interatomic distances between doubled layers in comparison with usual hexagonal close packed .alpha.-form of metal zirconium or hafnium is presented. The metal zirconium and hafnium with such a crystal structure are obtained by an electrochemical reduction process of solid zirconium monochloride or hafnium monochloride which serves as a cathode at a temperature about 450.degree. C. (830.degree. F.) in molten inorganic electrolyte consisting of lithium chloride and chlorides of alkali and alkaline earth metals in the presence of an inert anode, or metal zirconium or hafnium anode. X-ray analysis results of an obtained polymorphic modification of metal zirconium and resulting density are presented.
REFERENCES:
patent: 2734856 (1956-02-01), Schultz et al.
patent: 2864749 (1958-12-01), Slatin
patent: 2941931 (1960-06-01), Dean
patent: 3444058 (1969-05-01), Mellors et al.
patent: 3498894 (1970-03-01), Cuomo et al.
patent: 4588485 (1986-05-01), Cohen et al.
patent: 4686025 (1987-08-01), Cohen et al.
patent: 4923579 (1990-05-01), Snyder et al.
S.I.Troyanov, V.I.Tsirelnikov, Zirconium, monochloride, Russ.J.Inorg.Chem., vol. 15, No. 12, p. 1762, Dec. 1970.
S.I.Troyanov, Structure of zirconium monochloride, Russ.J.Inorg.Chem., vol. 28, No. 3, pp. 89-91, Mar. 1973.
D.G.Adolfson, J.D.Corbett, Crystal structure of zirconium monochloride. A novel phase containing metal-metal bonded sheets, Inorg.Chem., vol. 15, pp. 1820-1823, Jan. 1977.
S.I.Troyanov et al. The thermogravimetric determination of heats of formation of lower halides of zirconium, Izv.Sib.Otd.Acad.Sci., USSR, Chem., Chem.Techn., vol. 4, No. 9, pp. 116-119, Sep. 1974.
M. A. Steinberg et al's Extractive Metallurgy of Zirconium by the Electrolysis of FusedSalts, Journal of the Electrochem.,Soc., vol. 101, No. 2, pp. 137-144, Feb. 1954.
M.V.Smirnov et al., Cathodic process during deposition of zirconium from chloride melts, Russ.J.Phys.Chem., vol. 37, No. 8, pp. 901-905, Aug. 1963.
C.M.Craighead et al., Nature of the markings in Titanium and alfa Titanium Alloys, J.Metals, vol. 4 No. 12, pp. 1317-1319, Dec. 1952.
H.S.Marek et al., Crystal structure and thermodynamic characteristics of zirconium and hafnium monobromides, Russ. J Inorg.Chem., vol. 24, No. 4, pp. 890-893, Sep. 1979.
A.S.Izmailovich et al. Lower chlorides of hafnium, Russ.J.Inorg.Chem., vol. 24, No. 9. pp. 1309-1312, Sep. 1979.
Raynes et al The Extractive Metallurgy of Zirconium Metal: III. Expanded Scale Process Development of the Electrolytic Production of Zirconium from K2zrF6., Journal of The Electrochemical Society, vol. 102, No. 2, pp. 137-144, Mar. 1955.
Miller, Zirconium, TN799, Z5M5, pp. 58-61, and 99-108, No Month Available 1954.
Department of Commerce, US Bureau of Mines, Information Circular 6456, Zirconium Part I, Jun. 1931.
Department of Commerce, US Bureau of Mines, Information Circular 6456, Zirconium Part II, Jun. 1931.
M. A. Steinberg et al's Extractive Metallurgy of Zirconium by the Electrolysis of Fused Salts, Journal of the Electrochemical Society, vol. 101, No. 2, pp. 63-78, Feb. 1954.
Gorgos Kathryn
Smith-Hicks Erica
LandOfFree
Allotropic modification of zirconium and hafnium metals and meth does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Allotropic modification of zirconium and hafnium metals and meth, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Allotropic modification of zirconium and hafnium metals and meth will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-538355