All-purpose liquid abrasive cleaner

Details All-purpose liquid abrasive cleaner All-purpose liquid abrasive cleaner

1978-10-10

1981-11-24

Willis, Jr., P. E.

Compositions

Compositions containing a single chemical reactant or plural...

Organic reactant

252120, 252131, 252140, 252155, 252531, 252540, 252550, 252559, 252DIG14, C11D 314, C11D 920

Patent

active

043023479

ABSTRACT:
A liquid hard surface cleaning composition comprising, by weight, 1% to 20% of water-insoluble, particulate abrasive having a particle size in the range of 1 to 40 microns; 3% to 15% of a synthetic, organic, anionic detergent; 1% to 7.5% of an ethyleneoxylated alkanol nonionic detergent, the weight ratio of anionic detergent to nonionic detergent being from 1.75:1 to 3:1; 1% to 15% of a detergent builder salt, the weight ratio of builder salt to total detergent being in the range of 1:4 to 2:1; and an aqueous medium; the proportions of the components being so adjusted within the specified ranges that some of the detergent is present in liquid crystal form and the abrasive is maintained in stable suspension.

REFERENCES:
patent: 3149078 (1964-09-01), Zmoda
patent: 3210285 (1965-10-01), Gangwisch
patent: 3214380 (1965-10-01), Gangwisch
patent: 3281367 (1966-10-01), Jones et al.
patent: 3677954 (1972-07-01), Nakajima et al.
patent: 3956158 (1976-05-01), Donaldson
patent: 3957695 (1976-05-01), Davies et al.
patent: 4005027 (1977-01-01), Hartman
patent: 4107067 (1978-08-01), Murphy et al.
patent: 4122025 (1978-10-01), Kiewert et al.
patent: 4129423 (1978-12-01), Rubin
patent: 4129527 (1978-12-01), Clark et al.
patent: 4244840 (1981-01-01), Straw

Affiliated with

Also associated with

Rating

All-purpose liquid abrasive cleaner does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with All-purpose liquid abrasive cleaner, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and All-purpose liquid abrasive cleaner will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2173986