All-polymeric phase shift masks

Details All-polymeric phase shift masks All-polymeric phase shift masks

1995-06-02

1997-09-02

McPherson, John A.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430321, G03F 900

Patent

active

056630166

ABSTRACT:
An embodiment of the present invention is a process in which a polymer solution is spin coated onto a master data recording disk, such as glass substrate with photoresist images, before separating. After drying and forming polymer, a polymer membrane results which is a faithful reproduction of micron-sized optical recording features on the surface of the master. Such membrane is either peeled-off and mounted to a pellicle-like frame or first laminated to a stiffer, stronger substrate before peeling to support the duplicate.

REFERENCES:
patent: 5126180 (1992-06-01), Gotoh et al.
Steven Brown, "The decade of the CD", San Jose Mercury News, p. 8, Jan. 9, 1994.
Y. Okino, et al., "Developments in fabrication of optical disks", Optical Disk Technology, pp. 236-241, 1982.
S. Horigome, "Novel stamper process for optical disc", Optical Storage Technology, pp. 121-128, 1988.

Affiliated with

Also associated with

Rating

All-polymeric phase shift masks does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with All-polymeric phase shift masks, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and All-polymeric phase shift masks will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-306933