All electric LNG system and process

Refrigeration – Cryogenic treatment of gas or gas mixture – Liquefaction

Reexamination Certificate

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C060S772000, C060S039182

Reexamination Certificate

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07114351

ABSTRACT:
A reduced carbon dioxide emissions system and method for providing power for refrigerant compression and shared electrical power for a light hydrocarbon gas liquefaction process.

REFERENCES:
patent: 4566885 (1986-01-01), Haak
patent: 4755200 (1988-07-01), Liu et al.
patent: 4907405 (1990-03-01), Polizzotto
patent: 5139548 (1992-08-01), Liu et al.
patent: 5295350 (1994-03-01), Child et al.
patent: 5689141 (1997-11-01), Kikkawa et al.
patent: 6389844 (2002-05-01), Klein Nagel Voort
patent: 6449984 (2002-09-01), Paradowski
patent: 6640586 (2003-11-01), Hahn et al.
patent: 6658891 (2003-12-01), Reijnen et al.
patent: 0235610 (2002-10-01), None
patent: 10119761 (2002-10-01), None
patent: 0140725 (2001-06-01), None
Bauer, H., “A Novel Concept”, Hydrogen Engineering (May 2002) p. 59 et seq.
Bauer, H., “A Novel Concept”, Hydrocarbon Engineering (May 2002) p. 59 et seq.
Fallaize, et al., “Next Generation LNG—eDrive” AICHE Spring Mtg. (Mar. 2002).
PCT Search Report PCT/US03/30552.
Murtaza Khakoo, Beatrice Fischer and Jean-Christophe Raillard, “The Next Generation of LNG Plants,” LNG 13 Conference, May 14, -17, 2001, Seoul, Korea.
Siemens Aktiengesellschaft, “The All Electric Driven LNG Plant,” May 9, 2001, 1stBP Upstream Energy Conference, Houston, Texas.

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