Alkytinfluoride composition for deposition of tin oxide films

Coating processes – Coating by vapor – gas – or smoke – Base includes an inorganic compound containing silicon or...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

10628719, 423492, 427168, 4272481, 427314, 556 81, 556 98, C23C 1600, C08L 9500, C09D 324

Patent

active

049486322

ABSTRACT:
A method for selecting preferred coating reactants by thermal analysis of decomposition is disclosed along with a preferred coating reactant comprising dibutyltin difluoride in polymolecular form.

REFERENCES:
patent: 4240816 (1980-12-01), McMaster et al.
patent: 4263335 (1981-04-01), Wagner et al.
patent: 4325988 (1982-04-01), Wagner
patent: 4344986 (1982-08-01), Henery
patent: 4397671 (1983-08-01), Vong
patent: 4401695 (1983-08-01), Sopko
patent: 4533571 (1985-08-01), Kramer et al.
patent: 4562095 (1985-12-01), Coulon et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Alkytinfluoride composition for deposition of tin oxide films does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Alkytinfluoride composition for deposition of tin oxide films, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Alkytinfluoride composition for deposition of tin oxide films will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-461720

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.