Organic compounds -- part of the class 532-570 series – Organic compounds – Heavy metal containing
Patent
1995-06-07
1996-12-17
Geist, Gary
Organic compounds -- part of the class 532-570 series
Organic compounds
Heavy metal containing
556 64, 562113, 568 1, 568 77, C07F 502, C07F 966, C07F 990, C07C38112
Patent
active
055855075
ABSTRACT:
A photoresist composition containing an alkylsulfonium salt compound represented by the following general formula (I): ##STR1## Wherein R.sup.1 and R.sup.2 may be the same or different, each being a linear, branched or cyclic C.sub.1 to C.sub.8 alkyl radical, R.sup.3 is a linear, branched or cyclic C.sub.1 to C.sub.8 alkyl radical, a C.sub.5 to C.sub.7 2-oxocycloalkyl radical, or a linear or branched C.sub.3 to C.sub.8 2-oxoalkyl radical, and Y.sup.- represents a counter ion. The photoresist composition has high transparency to deep U.V. light having wavelengths of 220 nm or less and is capable of forming good fine patterns with high sensitivity, thus being useful as chemically amplified type resist which is exposed to the deep U.V. light from an ArF excimer laser.
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Hasegawa Etsuo
Iwasa Shigeyuki
Maeda Katsumi
Nakano Kaichiro
Geist Gary
Jones Dwayne C.
NEC Corporation
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