Gas separation: processes – Selective diffusion of gases
Patent
1992-09-02
1993-11-30
Spitzer, Robert
Gas separation: processes
Selective diffusion of gases
95 34, 96 14, B01D 5322, B01D 7164
Patent
active
052661008
ABSTRACT:
Novel aromatic polyimide, polyamide and polyamide-imide gas separation membranes and the process of using such membranes to separate one or more gases from a gaseous mixture is disclosed. The polyimides, polyamides and polyamide-imides are formed from diamines of the formula ##STR1## where Ar' is ##STR2## Q is nothing or an aromatic group and Z is independently alkyl groups having 1 to 10 carbon atoms, most preferably a tertiary butyl group, n is an integer from 0 to 4, preferably 1.
REFERENCES:
patent: Re30351 (1980-07-01), Hoehn et al.
patent: 3822202 (1974-07-01), Hoehn
patent: 3899309 (1975-08-01), Hoehn et al.
patent: 4240914 (1980-12-01), Iwama et al.
patent: 4307135 (1981-12-01), Fox
patent: 4358378 (1982-11-01), Iwama et al.
patent: 4378324 (1983-03-01), Makino et al.
patent: 4378400 (1983-03-01), Makino et al.
patent: 4385084 (1983-05-01), Iwama et al.
patent: 4420568 (1983-12-01), Wang et al.
patent: 4440643 (1984-04-01), Makino et al.
patent: 4460526 (1984-07-01), Makino et al.
patent: 4474662 (1984-10-01), Makino et al.
patent: 4474663 (1984-10-01), Nakajima et al.
patent: 4474858 (1984-10-01), Makino et al.
patent: 4485056 (1984-11-01), Makino et al.
patent: 4485140 (1984-11-01), Gannett et al.
patent: 4512893 (1985-04-01), Makino et al.
patent: 4523893 (1985-06-01), Johst et al.
patent: 4528004 (1985-07-01), Makino et al.
patent: 4636314 (1987-01-01), Beuhler et al.
patent: 4690873 (1987-09-01), Makino et al.
patent: 4696994 (1987-09-01), Nakajima et al.
patent: 4705540 (1987-11-01), Hayes
patent: 4714482 (1987-12-01), Polak et al.
patent: 4717393 (1988-01-01), Hayes
patent: 4717394 (1988-01-01), Hayes
patent: 4725642 (1988-02-01), Gannett et al.
patent: 4758875 (1988-07-01), Fujisaki et al.
patent: 4830640 (1989-05-01), Nakamura et al.
patent: 4832713 (1989-05-01), Yamada et al.
patent: 4838900 (1989-06-01), Hayes
patent: 4851505 (1989-07-01), Hayes
patent: 4880442 (1989-11-01), Hayes
patent: 4897092 (1990-01-01), Burgoyne, Jr. et al.
patent: 4912197 (1990-03-01), Hayes
patent: 4931539 (1990-06-01), Hayes
patent: 4932982 (1990-06-01), Hayes
patent: 4932983 (1990-06-01), Hayes
patent: 4935490 (1990-06-01), Hayes
patent: 4948400 (1990-08-01), Yamada et al.
patent: 4949405 (1990-05-01), Kohn
patent: 4952220 (1990-08-01), Langsam et al.
patent: 4954144 (1990-09-01), Burgoyne, Jr. et al.
patent: 4968331 (1990-11-01), Sakashita et al.
patent: 4975190 (1990-12-01), Sakashita et al.
patent: 4981497 (1991-01-01), Hayes
patent: 4983191 (1991-01-01), Ekiner et al.
patent: 4988371 (1991-01-01), Jeanes et al.
patent: 4997462 (1991-03-01), Nakatani et al.
patent: 5009679 (1991-04-01), Angus et al.
patent: 5015270 (1991-05-01), Ekiner et al.
patent: 5032149 (1991-07-01), Hayes
patent: 5034027 (1991-07-01), Tien et al.
patent: 5042992 (1991-08-01), Blinka et al.
patent: 5042993 (1991-08-01), Meier et al.
patent: 5045093 (1991-09-01), Meier et al.
patent: 5067970 (1991-11-01), Wang et al.
patent: 5071452 (1991-12-01), Avrillon et al.
patent: 5074891 (1991-12-01), Kohn et al.
patent: 5076816 (1991-12-01), Avrillon et al.
patent: 5076817 (1991-12-01), Hayes
patent: 5080698 (1992-01-01), Krizan
patent: 5085676 (1992-02-01), Ekiner et al.
patent: 5085774 (1992-02-01), Ekiner et al.
patent: 5122941 (1992-05-01), Kasai et al.
patent: 5178650 (1993-01-01), Hayes
patent: 5178940 (1993-01-01), Matsumoto et al.
E. I. Du Pont de Nemours and Company
Levitt Cary A.
Spitzer Robert
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