Alkaline water-based solution for cleaning metallized microelect

Details Alkaline water-based solution for cleaning metallized microelect Alkaline water-based solution for cleaning metallized microelect

1998-06-18

1999-11-09

Warden, Jill

Cleaning and liquid contact with solids

Processes

For metallic, siliceous, or calcareous basework, including...

134 3, 134 41, C03C 2300, C23G 102

Patent

active

059806435

ABSTRACT:
A method for use in the manufacture of a microelectronic device is set forth. The method include to a first step in which a workpiece including exposed aluminum metallized surfaces and residues is provided. The workpiece, including the exposed aluminum metallized surfaces, is then treated with an alkaline, water-based solution containing one or more components that form an aluminosilicate on the exposed aluminum metallized surfaces. The solution reacts with the residues and assists in removing them from the workpiece. Preferably, the solution is comprised of DI water, and ammonium hydroxide based component, such as TMAH, silicic acid, and aluminum hydroxide.

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