Alkaline etchant for controlling surface roughness of...

Details Alkaline etchant for controlling surface roughness of... Alkaline etchant for controlling surface roughness of...

2005-03-25

2010-12-14

Vinh, Lan (Department: 1713)

Semiconductor device manufacturing: process

Chemical etching

Liquid phase etching

C438S745000, C438S750000, C216S090000

Reexamination Certificate

active

07851375

ABSTRACT:
An alkali etchant for controlling surface roughness of a semiconductor wafer, which is a sodium hydroxide solution or a potassium hydroxide solution having a weight concentration of 55 wt % to 70 wt %.

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