Alkaline developable photoresist composition containing radiatio

Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...

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430191, 430192, 430193, 430313, G03F 7023, G03F 7075

Patent

active

052387739

ABSTRACT:
A composition containing an organosilicon material having terminal quinone groups, and a phenolic-novolak polymer, and use thereof in photolithography.

REFERENCES:
patent: 4603195 (1986-07-01), Babich et al.
patent: 4722881 (1988-02-01), Ueno et al.
Shaw, J. et al., "Polysiloxanes for Optical Lithography", Solid State Technology, Jun. 1987, pp. 83-89.

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