Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1992-06-08
1993-08-24
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430191, 430192, 430193, 430313, G03F 7023, G03F 7075
Patent
active
052387739
ABSTRACT:
A composition containing an organosilicon material having terminal quinone groups, and a phenolic-novolak polymer, and use thereof in photolithography.
REFERENCES:
patent: 4603195 (1986-07-01), Babich et al.
patent: 4722881 (1988-02-01), Ueno et al.
Shaw, J. et al., "Polysiloxanes for Optical Lithography", Solid State Technology, Jun. 1987, pp. 83-89.
Babich Edward D.
Flagello Donis G.
Hatzakis Michael
Paraszczak Jurij R.
Shaw Jane M.
Bowers Jr. Charles L.
International Business Machines - Corporation
Young Christopher G.
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