Alkaline cell with gassing inhibitors

Details Alkaline cell with gassing inhibitors Alkaline cell with gassing inhibitors

2005-03-29

2005-03-29

Kalafut, Stephen J. (Department: 1745)

Chemistry: electrical current producing apparatus, product, and

Current producing cell, elements, subcombinations and...

Electrode

C429S217000, C429S229000

Reexamination Certificate

active

06872489

ABSTRACT:
A sulfonic acid type organic surfactant is incorporated into the gelled anode of an alkaline electrochemical cell, optionally with an organic phosphate ester surfactant. When the two surfactants are provided in a gelled anode in combination, discharge leakage is reduced and gel gassing is suppressed relative to that of gels lacking both surfactants. Additionally, cell discharge performance is improved relative to that of cells lacking both surfactant additives.

REFERENCES:
patent: 3918989 (1975-11-01), Gillman et al.
patent: 4595526 (1986-06-01), Lai
patent: 4777100 (1988-10-01), Chalilpoyil
patent: 5128222 (1992-07-01), Yoshizawa et al.
patent: 5401590 (1995-03-01), Chalilpoyil
patent: 5912208 (1999-06-01), Hioki et al.
patent: 6040088 (2000-03-01), Bennett
patent: 6284410 (2001-09-01), Durkot et al.
patent: 6555266 (2003-04-01), Woodnorth et al.
patent: 6586385 (2003-07-01), Wisniewski et al.
patent: 6716804 (2004-04-01), Scherubel
patent: 62-222568 (1987-09-01), None
patent: 1231272 (1989-09-01), None
patent: 3071559 (1991-03-01), None
patent: 5174826 (1993-07-01), None
Richard J. Lewis, Sr., Hawley's Condensed Chemical Dictionary, pp. 1055 and 1060, Twelth Edition, Van Nostrad Reinhold Company, New York.

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