Alkali-soluble siloxane polymer, silmethylene polymer, and polyo

Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – From silicon reactant having at least one...

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528 14, 528 37, 528 21, 528 23, 528 25, 556431, 556449, 556450, C08G 7700

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047451696

ABSTRACT:
There are provided an alkali-soluble siloxane polymer, an alkali-soluble silmethylene polymer, and an alkali-soluble polyorganosilsesquioxane polymer. They are useful as a photoresist for the fabrication of semiconductor devices. They are suitable for dry etching because of their superior resistance to oxygen plasmas.

REFERENCES:
patent: 3328450 (1967-06-01), Plueddemann
patent: 3837897 (1974-09-01), Marzocchi
patent: 4626556 (1986-12-01), Nozue et al.
Hackh's Chemical Dictionary, 4th Ed., 1972, p. 87.

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