Alkali-free glass for photoetching mask

Details Alkali-free glass for photoetching mask Alkali-free glass for photoetching mask

1982-02-24

1983-07-05

McCarthy, Helen M.

Compositions: ceramic

Ceramic compositions

Glass compositions, compositions containing glass other than...

313480, 501 57, C03C 310

Patent

active

043919162

ABSTRACT:
An alkali-free glass composition for a photoetching mask is described, which comprises, all by mol, 55 to 65% SiO.sub.2, 7 to 11% Al.sub.2 O.sub.3, 1 to 11% PbO, 7 to 20% CaO, 3 to 13% MgO, 3 to 13% ZnO, 0 to 3% ZrO.sub.2, 0 to 3% F.sub.2, 0 to 5% As.sub.2 O.sub.3, and 0 to 5% Sb.sub.2 O.sub.3. This glass is free from defects such as pinholes, has a relatively low coefficient of thermal expansion and contains no air bubbles, and a photoetching mask composed of the glass composition.

REFERENCES:
patent: 3069294 (1962-12-01), Davis

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