Alkali etching liquid for silicon wafer and etching method...

Details Alkali etching liquid for silicon wafer and etching method... Alkali etching liquid for silicon wafer and etching method...

2005-12-08

2009-11-17

Chen, Kin-Chan (Department: 1792)

Semiconductor device manufacturing: process

Chemical etching

Liquid phase etching

C438S753000, C252S079100

Reexamination Certificate

active

07618897

ABSTRACT:
An alkali etching liquid for a silicon wafer that includes an aqueous solution of potassium hydroxide, and from 0.1 g/L to 0.5 g/L of diethylene triamine pentaacetic acid. Furthermore, the Fe concentration of the aqueous solution of potassium hydroxide is no more than 50 ppb. An etching method that including a step of etching a silicon wafer with a resistivity of no more than 1Ω·cm using the etching liquid.

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