Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1994-12-30
1995-12-26
Chu, John S. Y.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430176, 430191, 430192, 430193, 430280, 430281, 430283, 430288, 430302, 430906, 430910, 526287, 526288, G03F 7021, G03F 7023, G03F 7033
Patent
active
054786908
ABSTRACT:
Disclosed is an alkali developable photosensitive resin composition useful for an offset printing plate, which has excellent developability and provides long life of a developer. The photosensitive resin composition comprising:
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Patent Abstracts of Japan, vol. 6, No. 18 (P-100) (896) 2 Feb. 1982 & JP-A-56 142 528 (Mitsubishi Kasei Kogyo K K) 6 Nov. 1981 *Abstract*.
Arimatsu Seiji
Ichinose Yoshifumi
Kanda Kazunori
Chu John S. Y.
Nippon Paint Co. Ltd.
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