Alignment techniques for photolithography utilizing multiple pho

Details Alignment techniques for photolithography utilizing multiple pho Alignment techniques for photolithography utilizing multiple pho

1998-07-08

2000-03-28

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Registration or layout process other than color proofing

430312, 430328, G03F 900

Patent

active

060429755

ABSTRACT:
The specification describes a photolithography process using multiple exposures to form z-dimension patterns. Multiple exposures at different thickness levels are made using photomasks aligned with a latent image of alignment marks formed during the first exposure. The latent image is visible to the alignment system of commercial steppers.

REFERENCES:
patent: 5496669 (1996-03-01), Pforr et al.

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