Alignment target image enhancement for microlithography process

Details Alignment target image enhancement for microlithography process Alignment target image enhancement for microlithography process

1985-01-23

1986-12-30

Rosenberger, R. A.

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

G01B 1127

Patent

active

046325573

ABSTRACT:
A reflective target region is surrounded by a substantial light scattering region on a substrate to increase the contrast. The width of any reflective portion of the light scattering region is substantially smaller than the width of the target region along the orthogonal axis of the substrate. The light scattering region includes a plurality of peaks and valleys having parallel axis which are oblique to the axis of the substrate.

REFERENCES:
patent: 3199114 (1965-08-01), Malifaud
patent: 3652370 (1972-03-01), Motai
patent: 4013465 (1977-03-01), Clapham et al.
patent: 4103998 (1978-08-01), Nakazzwa et al.
patent: 4114983 (1978-09-01), Maffitt et al.
patent: 4200395 (1980-04-01), Smith et al.
patent: 4211489 (1980-07-01), Kleinknecht et al.
patent: 4356223 (1982-10-01), Iida et al.
patent: 4379180 (1983-04-01), Baglin et al.
patent: 4390279 (1983-06-01), Suwa

Affiliated with

Also associated with

Rating

Alignment target image enhancement for microlithography process does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Alignment target image enhancement for microlithography process, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Alignment target image enhancement for microlithography process will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1544312