Alignment systems for imprint lithography

Details Alignment systems for imprint lithography Alignment systems for imprint lithography

2006-07-04

2006-07-04

Smith, Duane (Department: 1722)

Plastic article or earthenware shaping or treating: apparatus

Means applying electrical or wave energy directly to work

Radiated energy

C430S030000, C700S240000

Reexamination Certificate

active

07070405

ABSTRACT:
Described are systems for patterning a substrate by imprint lithography. Imprint lithography systems include an imprint head configured to hold a template in a spaced relation to a substrate. The imprint lithography system is configured to dispense an activating light curable liquid onto a substrate or template. The system includes a light source that applies activating light to cure the activating light curable liquid. Multiple optical imaging devices are used to align the template with the substrate.

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