Alignment system using an electron beam

Details Alignment system using an electron beam Alignment system using an electron beam

1987-02-02

1989-03-14

Anderson, Bruce C.

Radiant energy

Means to align or position an object relative to a source or...

2504922, G01B 1500, H01L 2166

Patent

active

048126624

ABSTRACT:
An alignment system for aligning a mask and a wafer each having an alignment mark, includes an irradiation system for irradiating the alignment marks of the mask and the wafer with an electron beam, a detecting system for detecting the amount of electron beam absorbed by the alignment marks, and an adjusting system for adjusting a relative position of the mask and the wafer, in accordance with the detection, so as to bring the mask and the wafer into a predetermined positional relation.

REFERENCES:
patent: 3210101 (1973-01-01), O'Keefe et al.
patent: 3745358 (1973-07-01), Firtz et al.
patent: 3879613 (1975-04-01), Scott et al.

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