Alignment system for use in pattern transfer apparatus

Radiant energy – Photocells; circuits and apparatus – Photocell controls its own optical systems

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

250557, 356400, 356401, H01L 2130

Patent

active

047806150

ABSTRACT:
An alignment system usable in a semiconductor device manufacturing exposure apparatus for superimposingly transferring a circuit pattern of a reticle onto each of patterns formed on individual portions of a semiconductor wafer, for sequentially aligning the individual portions of the wafer with respect to the reticle by use of alignment marks formed in or on scribe lines defined between the individual portions of the wafer. An optical system for detecting the alignment marks is disposed outside the path of light used for the sake of pattern transfer. In the course of movement of the wafer for bringing a particular shot area to an exposure station, the alignment marks for the particular shot area are photoelectrically detected through the mark detecting optical system and, on the basis of the detection of the alignment marks, the reticle and the wafer are relatively moved into alignment such that, when the particular shot area reaches the exposure station, the pattern of the reticle can be accurately superimposed on the pattern already formed on the particular shot area of the wafer. As a result, TTL (through-the-lens) alignment is assured without degradation of throughput of the exposure apparatus.

REFERENCES:
patent: 3670153 (1972-07-01), Rempert et al.
patent: 4167677 (1979-09-01), Suzuki
patent: 4315201 (1982-02-01), Suzuki et al.
patent: 4423959 (1984-01-01), Nakazawa et al.
patent: 4492459 (1985-01-01), Omata
patent: 4521082 (1985-07-01), Suzuki et al.
patent: 4617469 (1986-10-01), Takahashi et al.
patent: 4719357 (1988-01-01), Ayata et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Alignment system for use in pattern transfer apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Alignment system for use in pattern transfer apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Alignment system for use in pattern transfer apparatus will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2270759

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.