Alignment system for optical lithography

Details Alignment system for optical lithography Alignment system for optical lithography

2008-09-29

2010-12-07

Chowdhury, Tarifur R. (Department: 2886)

Optics: measuring and testing

By alignment in lateral direction

With light detector

C356S399000, C356S401000

Reexamination Certificate

active

07847938

ABSTRACT:
An alignment system for optical lithography uses cameras fixed to a movable stage and to a lithography unit to view unique microscopic non-uniformities that are inherent to the surface of a work piece, e.g., metal or ceramic microcrystalline grains, for position referencing. Stage cameras image two sites on the work piece through windows in the stage to establish original position templates. After the work piece has been repositioned, e.g., reversed topside-down, the same two sites are again viewed and template matching establishes the transformed coordinates of the work piece, e.g. by a lithography unit camera under which the stage moves to approximate site locations. Two corner cameras can serve as a coarse positioning mechanism. The alignment system is particular useful for backside alignment in printed circuit board lithography.

REFERENCES:
patent: 4261107 (1981-04-01), Coleman et al.
patent: 4798470 (1989-01-01), Moriyama et al.
patent: 4952060 (1990-08-01), Ina et al.
patent: 5015555 (1991-05-01), Lazaar
patent: 5124927 (1992-06-01), Hopewell et al.
patent: 5285397 (1994-02-01), Heier et al.
patent: 5407783 (1995-04-01), Caruso
patent: 5874190 (1999-02-01), Tanaka
patent: 6037791 (2000-03-01), Yap et al.
patent: 6525805 (2003-02-01), Heinle
patent: 6563586 (2003-05-01), Stanke et al.
patent: 6701197 (2004-03-01), Ben-Ezra et al.
patent: 6819789 (2004-11-01), Kantor et al.
patent: 6861186 (2005-03-01), Pagette et al.
patent: 6875992 (2005-04-01), Castenmiller et al.
patent: 6894261 (2005-05-01), Castenmiller et al.
patent: 6924883 (2005-08-01), Ozaki et al.
patent: 6936385 (2005-08-01), Lof et al.
patent: 7058474 (2006-06-01), Ganot et al.
patent: 7062354 (2006-06-01), Ganot et al.
patent: 7167296 (2007-01-01), Meisburger
patent: 7295362 (2007-11-01), Meisburger
patent: 2002/0055789 (2002-05-01), Ben-Ezra et al.
patent: 2003/0064307 (2003-04-01), Nakamura et al.
patent: 2003/0103277 (2003-06-01), Mohwinkel
patent: 2003/0190071 (2003-10-01), Ganot et al.
patent: 2005/0213064 (2005-09-01), Katayama et al.
patent: 2005/0213806 (2005-09-01), Hanina et al.
patent: 2005/0225788 (2005-10-01), Katayama et al.
patent: 2006/0091330 (2006-05-01), Van Bilsen et al.
patent: 2006/0092199 (2006-05-01), White et al.
patent: 2006/0170934 (2006-08-01), Picciotto et al.
patent: 2007/0035709 (2007-02-01), Kuit et al.
patent: 2007/0046940 (2007-03-01), Gao et al.
B.F. Conaghan,, Ph.D., “Printed Circuits Handbook”, C.F. Coombs, Jr., ed., 5th ed., (McGravel-Hill, 2001), Chapter 26, 30 pages.

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