Alignment system and projection exposure apparatus

Details Alignment system and projection exposure apparatus Alignment system and projection exposure apparatus

2005-01-25

2005-01-25

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S067000

Reexamination Certificate

active

06847432

ABSTRACT:
An alignment system for aligning a reticle having a pattern and an alignment mark with a photosensitive substrate to which the pattern of the reticle is to be transferred, is disclosed. The alignment system includes a movable substrate stage for holding the substrate, and a light-transparent plate having a mark for relative positioning with respect to at least one of the reticle and the substrate stage, wherein positioning of at least one of the reticle and the substrate stage is performed on the basis of the mark provided on the light-transparent plate.

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patent: 6198527 (2001-03-01), Nishi
patent: 6532056 (2003-03-01), Osakabe et al.

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