Alignment system

Details Alignment system Alignment system

1993-07-15

1995-01-03

Evans, F. L.

Optics: measuring and testing

By alignment in lateral direction

With light detector

250548, 356401, G01B 1100

Patent

active

053791088

ABSTRACT:
An alignment system includes an alignment detector for detecting a relative deviation of the mask and the wafer from a predetermined positional relationship, a stage mechanism for moving the mask relative to the wafer, an interferometer device for producing information related to the movement by the stage mechanism, and a controller for determining an input to be applied to the stage mechanism so as to bring the mask and the wafer into the predetermined positional relationship, on the basis of a detected value obtained through the alignment detector and a measured value obtained through the interferometer device, both being uptaken at the same timing, and for controlling the stage mechanism on the basis of the thus determined input.

REFERENCES:
patent: 4880308 (1989-11-01), Shirasu
patent: 5142156 (1992-08-01), Ozawa et al.
patent: 5182615 (1993-01-01), Kurosawa et al.
patent: 5200800 (1993-04-01), Suda et al.

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