Alignment patterns for two objects to be aligned relative to eac

Details Alignment patterns for two objects to be aligned relative to eac Alignment patterns for two objects to be aligned relative to eac

1991-01-11

1992-12-15

Evans, F. L.

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

250548, G01B 1127

Patent

active

051721902

ABSTRACT:
The invention relates to alignment marks for a process for aligning two objects relative to each other by means of an image recognition system wherein the lines are optoelectronically scanned and the obtained brightness values are integrated line-by-line. The advantages of the alignment marks according to the invention reside in that position inaccuracies due to the mutual optical influence of the alignment marks in the optoelectronic evaluation are avoided and furthermore in a high evaluation speed.

REFERENCES:
patent: 3821545 (1974-06-01), Nakagawa et al.
patent: 3861798 (1975-01-01), Kobayashi et al.
patent: 3928094 (1975-12-01), Angell
patent: 4815854 (1989-03-01), Tanaka et al.
patent: 4838693 (1989-01-01), Uchida et al.
Soviet Inventions Illustrated, Section E1, Week 8426, Aug. 1984, SU 10467A.

Affiliated with

Also associated with

Rating

Alignment patterns for two objects to be aligned relative to eac does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Alignment patterns for two objects to be aligned relative to eac, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Alignment patterns for two objects to be aligned relative to eac will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2097470