Alignment pattern and alignment method for a scanning system

Radiant energy – Photocells; circuits and apparatus – Photocell controlled circuit

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

356400, 382317, G01B 1100

Patent

active

059397080

ABSTRACT:
An alignment pattern of the present invention includes a resolution analysis pattern that is formed on the central portion of the alignment pattern for the resolution analysis of a scanning system. A pair of horizontal alignment patterns that cosists of a black zone and a white zone are formed adjacent to the terminations of the resolution analysis pattern for horizontal and boundary alignments. The pattern arrangement of the pair horizontal alignment patterns is not only upside down but also a mirror image with each other. The black zone includes a shallow indented portion adjacent to the resolution analysis pattern in the black zone and on the border of the black zone, white zone. A white rectangular figure is exactly formed over or under the shallow indented portion in the black zone and parallel to the shallow indented portion. The area between the shallow indented portion and the white rectangular figure is used to serve as a horizontal fine alignment for the scanning system. A deep indented portion is adjacent to the shallow indented portion in the black zone and on the border of the black zone and white zone. The deep indented portion is serve as a boundary alignment pattern for boundary alignment of the scanning system. Moreover, the area among the deep indented portion, the shallow indented portion and the white rectangular figure acts as a horizontal rough alignment for the scanning system.

REFERENCES:
patent: 4641357 (1987-02-01), Satoh
patent: 5420944 (1995-05-01), Concannon et al.
patent: 5786590 (1998-07-01), Lin

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Alignment pattern and alignment method for a scanning system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Alignment pattern and alignment method for a scanning system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Alignment pattern and alignment method for a scanning system will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-316825

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.