Alignment of mask and semiconductor wafer using linear fresnel z

Details Alignment of mask and semiconductor wafer using linear fresnel z Alignment of mask and semiconductor wafer using linear fresnel z

1990-01-25

1990-08-14

Willis, Davis L.

Radiant energy

Photocells; circuits and apparatus

Photocell controls its own optical systems

356401, G01N 2186

Patent

active

049489836

ABSTRACT:
A system for aligning a mask and a semiconductor wafer comprises radiation source for producing a radiation beam, a dual focus linear Fresnel zone plate provided on the mask for focusing the radiation beam incident thereto on a surface of the semiconductor wafer which comprises a first part having a first focal length and a second part having a second focal length substantially smaller than the first focal length, a diffraction grating provided on the surface of the semiconductor wafer in correspondence to the dual focus linear Fresnel zone plate for diffracting the radiation beam focused thereon, a detector held with a predetermined relationship with respect to the radiation source and the mask for detecting the diffracted beam, a movable stage for supporting the semiconductor wafer, and a controller for moving the stage means responsive to an output signal of the detection means.

REFERENCES:
patent: 4704033 (1987-11-01), Fay et al.
patent: 4815854 (1989-03-01), Tanaka et al.

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