Alignment method for patterning

Details Alignment method for patterning Alignment method for patterning

1990-07-03

1991-10-22

Nelms, David C.

Radiant energy

Photocells; circuits and apparatus

Photocell controls its own optical systems

430311, G01N 2186

Patent

active

050598082

ABSTRACT:
There is disclosed an alignment method comprising the steps of irradiating an alignment light toward an alignment mark whose surface has a high reflectance, the alignment mark being coated by a resist film, and performing alignment on the basis of the resultant intensity of reflected light from the surface of the resist and reflected light from an interface between the resist and the mark portion. The resist comprises a chemical material having a light absorption characteristic in a wavelength band of the alignment light, and is irrespective of that of an exposure light used to expose the resist.

REFERENCES:
patent: 3885877 (1975-05-01), Horwath et al.
patent: 4575399 (1986-03-01), Tanaka et al.
patent: 4677043 (1987-06-01), Cordes et al.
patent: 4681430 (1987-07-01), Goel et al.
patent: 4702992 (1987-10-01), Ishii et al.
patent: 4778739 (1988-10-01), Protschka

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