Alignment method, exposure apparatus and device fabrication...

Details Alignment method, exposure apparatus and device fabrication... Alignment method, exposure apparatus and device fabrication...

2005-11-08

2005-11-08

Kim, Peter B. (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C356S401000

Reexamination Certificate

active

06963389

ABSTRACT:
An alignment mark selection method includes steps of determining whether an alignment mark provided in a shot area on a substrate is selectable with respect to each alignment mark, and selecting alignment marks from alignment marks determined to be selectable in the determining step.

REFERENCES:
patent: 4918320 (1990-04-01), Hamasaki et al.
patent: 6238851 (2001-05-01), Nishi
patent: 6281965 (2001-08-01), Nakashima
patent: 2001/0049589 (2001-12-01), Yasuda et al.
patent: 2002/0042664 (2002-04-01), Kikuchi
patent: 2003/0058423 (2003-03-01), Wakamoto

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