Alignment method and apparatus using previous layer calculation

Details Alignment method and apparatus using previous layer calculation Alignment method and apparatus using previous layer calculation

1999-03-08

2000-03-28

Mathews, Alan A.

Photocopying

Projection printing and copying cameras

Step and repeat

356400, 356401, G03B 2742, G01B 1100

Patent

active

060438649

ABSTRACT:
An method and apparatus for aligning a mask to a wafer for photolithographic processing steps which does not use optical alignment. Each wafer is provided a unique identification code, such as a bar code. As wafers are processed through photolithographic steps where optical detection of an alignment mark can be easily accomplished the alignment data for each wafer is stored in a memory unit. At the next photolithographic step a detector reads the identification code and identifies the wafer being processed. The wafer identification is fed to a data processing unit which retrieves the alignment data for that wafer fro the memory unit. The data processing unit then feed alignment data to a mechanical controller which positions the wafer relative to the mask image being used in the photolithographic step.

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patent: 5859690 (1999-01-01), Tuguchi
patent: 5909030 (1999-06-01), Yoshitake et al.

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