Alignment method and apparatus therefor

Details Alignment method and apparatus therefor Alignment method and apparatus therefor

2005-04-05

2005-04-05

Tsai, Carol S. (Department: 2857)

Data processing: measuring, calibrating, or testing

Measurement system

Orientation or position

C355S053000, C250S548000

Reexamination Certificate

active

06876946

ABSTRACT:
A method of transferring a pattern of a mask onto shot areas on a substrate determines two sets of parameters in a single model equation. The parameters in one of the two sets relate to arrangement of a plurality of shot areas on the substrate, and the parameters in the other set relate to the shot areas per se. The mask and the substrate are moved relatively in accordance with the determined parameters.

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