Alignment method and apparatus, lithographic apparatus,...

Optics: measuring and testing – By alignment in lateral direction – With registration indicia

Reexamination Certificate

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Reexamination Certificate

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10887311

ABSTRACT:
In one embodiment, front to back side alignment optics are used to project a mark on the back side of a substrate. The front to back side alignment optics are arranged such that the image projected into the image window of the front to back side alignment optics is a translational replica of the mark on the back side of the substrate. One potential advantage of such an arrangement is that any slight inaccuracies in the location of the optical axis do not result in inaccuracies in the image of the substrate mark. The translational replica image can be used for alignment of the substrate.

REFERENCES:
patent: 5843831 (1998-12-01), Chung et al.
patent: 6376329 (2002-04-01), Sogard et al.
patent: 6525805 (2003-02-01), Heinle
patent: 6768539 (2004-07-01), Gui et al.
patent: 6936385 (2005-08-01), Lof et al.
patent: 7130049 (2006-10-01), Consolini et al.
patent: 2002/0109825 (2002-08-01), Gui et al.
patent: 2002/0167649 (2002-11-01), Heinle
patent: 2003/0194176 (2003-10-01), Townsend et al.
patent: 1 406 126 (2004-04-01), None
patent: 11-340120 (1999-12-01), None
European Search Report dated Nov. 29, 2005.

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