Alignment method, alignment apparatus, exposure apparatus...

Details Alignment method, alignment apparatus, exposure apparatus... Alignment method, alignment apparatus, exposure apparatus...

2007-03-13

2007-03-13

Toatley, Jr., Gregory J. (Department: 2877)

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

C430S022000, C355S053000, C250S548000

Reexamination Certificate

active

11304813

ABSTRACT:
An apparatus for determining positions of a plurality of regions formed on a substrate based on positions of a plurality of sample regions sampled from the plurality of regions. The apparatus includes a processor configured to control operation of a stage and an alignment optical system so as to obtain positions of the plurality of the sample regions sampled from the plurality of regions, to calculate a first conversion parameter and a second conversion parameter for converting designed positions of the plurality of regions into first and second determined positions of the plurality of regions based on at least designed positions of the plurality of the sample regions and positions of the plurality of the sample regions measured by the alignment optical system, and to determine whether to finish the position determinations based on a difference between the first conversion parameter and the second conversion parameter.

REFERENCES:
patent: 5153678 (1992-10-01), Ota
patent: 5805866 (1998-09-01), Magome et al.
patent: 6481003 (2002-11-01), Maeda
patent: 6984838 (2006-01-01), Kosugi
patent: 6992767 (2006-01-01), Matsumoto et al.

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