Alignment method

Details Alignment method Alignment method

1996-04-12

1998-11-03

Font, Frank G.

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

250548, 355 53, G01B 1100, G03B 2742

Patent

active

058317392

ABSTRACT:
An alignment method in which a plurality of areas on a wafer which are to be exposed are each aligned with respect to a reference position. The method includes: measuring array coordinates of a plurality of alignment measuring points; determining a reliability value for each alignment datum on the basis of a dispersion of differences (alignment data) between the measured array coordinates and the corresponding design values; calculating values of coordinate transformation parameters for obtaining actual array coordinates from the design array coordinates by using the reliability value as a weight; and obtaining array coordinates of each shot area by using the transformation parameters.

REFERENCES:
patent: 4780617 (1988-10-01), Umatate et al.
patent: 4833621 (1989-05-01), Umatate
patent: 4918320 (1990-04-01), Hamasaki et al.
patent: 5153678 (1992-10-01), Ota
patent: 5499099 (1996-03-01), Sato et al.
patent: 5521036 (1996-05-01), Iwamoto et al.
patent: 5525808 (1996-06-01), Irie et al.
patent: 5561606 (1996-10-01), Ota et la.

Affiliated with

Also associated with

Rating

Alignment method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Alignment method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Alignment method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-695951