Alignment measurement apparatus and method for using the same in

Details Alignment measurement apparatus and method for using the same in Alignment measurement apparatus and method for using the same in

1996-03-28

1998-06-09

Paumen, Gary F.

Electric lamp or space discharge component or device manufacturi

Apparatus

Testing or adjusting means

445 3, H01J 942

Patent

active

057625280

ABSTRACT:
An alignment measurement apparatus is used for measuring an exposure pattern during an exposure operation for forming phosphor layers on a panel surface of a color cathode-ray tube, and includes an image sensor, an image spatial filter, and an image processing equipment. The image sensor photographs the exposure pattern on the panel surface to which an illuminating device is provided, the image spatial filter makes 3-color phosphor dots brighter and clearer, and the image processing equipment calculates and outputs a value of deviation between the exposure pattern of the 3-color phosphors and a reference exposure pattern. Any blurred exposure pattern is made bright and clear by the image spatial filter so that the degree of any deviation between the black matrix hole and the center of the exposure pattern is measured at a high precision.

REFERENCES:
patent: 4584481 (1986-04-01), Matey
patent: 5685760 (1997-11-01), Han

Affiliated with

Also associated with

Rating

Alignment measurement apparatus and method for using the same in does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Alignment measurement apparatus and method for using the same in, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Alignment measurement apparatus and method for using the same in will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2193436