Alignment measurement apparatus and method for using the same in

Details Alignment measurement apparatus and method for using the same in Alignment measurement apparatus and method for using the same in

1998-03-12

1999-06-08

Ramsey, Kenneth J.

Electric lamp or space discharge component or device manufacturi

Process

With assembly or disassembly

H01J 942

Patent

active

059100362

ABSTRACT:
The alignment measurement apparatus disclosed is used for measuring an exposure pattern during an exposure operation for forming phosphor layers on a panel surface of a color cathode-ray tube, and includes an image sensor, an image spatial filter, and an image processing equipment. The image sensor photographs the exposure pattern on the panel surface to which an illuminating device is provided, the image spatial filter makes 3-color phosphor dots brighter and clearer, and the image processing equipment calculates and outputs a value of deviation between the exposure pattern of the 3-color phosphors and a reference exposure pattern. Any blurred exposure pattern is made bright and clear by the image spatial filter so that the degree of any deviation between the black matrix hole and the center of the exposure pattern is measured at a high precision.

REFERENCES:
patent: 4584481 (1986-04-01), Matey
patent: 5685760 (1997-11-01), Han

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