Alignment mark system and method to improve wafer alignment...

Details Alignment mark system and method to improve wafer alignment... Alignment mark system and method to improve wafer alignment...

2004-01-19

2008-11-25

Chowdhury, Tarifur R. (Department: 2886)

Optics: measuring and testing

By alignment in lateral direction

Reexamination Certificate

active

07456966

ABSTRACT:
The present invention is a system and method for use with alignment marks and search algorithms of diffraction pattern detection tools. The system and method of the invention significantly increases the capture range of diffraction pattern detection methods and enable more efficient operation of tools employing such detection methods.

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