Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2011-04-19
2011-04-19
Young, Christopher G (Department: 1721)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C430S022000
Reexamination Certificate
active
07927768
ABSTRACT:
A lithography mask is disclosed, comprising an alignment mark, including a first bar, a second bar crossing the first bar, and a specific pattern having different signatures with the first and second bars connecting to the second bar.
REFERENCES:
patent: 2005/0151473 (2005-07-01), Wan et al.
Chen Li-Wei
Fan Chih-Shen
Sung I-Chin
Wang Fa-Cheng
Muncy Geissler Olds & Lowe, PLLC
VisEra Technologies Company Limited
Young Christopher G
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