Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1991-09-10
1993-11-23
McCamish, Marion E.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430 4, 430311, G03F 900
Patent
active
052643107
ABSTRACT:
Alignment marks capable of providing accurate registration signals even if substrate surface is rough and capable of effectively preventing degradation of registration accuracy due to unevenness of a surface of a resist film, and method of forming such alignment marks are disclosed. The alignment marks include flat portions 1a having high vertical reflectance serving as the alignment mark portions and rough portions 1b, formed spaced apart from each other by a prescribed distance on a surface of a substrate 1 by irradiation of laser beam 50. Therefore, fluctuation of height of a surface of a resist film 13 formed on the alignment marks with an upper layer film posed therebetween can be prevented, and in turn, degradation of registration accuracy of masks due to the unevenness of the resist film surface can be effectively prevented. Even if the surface of the substrate is rough, flat portions 1a providing accurate signal waveforms can be easily formed.
REFERENCES:
patent: 4434224 (1984-02-01), Yoshikawa
patent: 5100834 (1992-03-01), Mukai
Kuniyoshi et al, "New Evaluation Approach of Alignment Signal from Resist-Coated Patterns", JJAP Series 3, pp. 124-129.
Chapman Mark A.
McCamish Marion E.
Mitsubishi Denki & Kabushiki Kaisha
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