Alignment mark for e-beam inspection of a semiconductor wafer

Details Alignment mark for e-beam inspection of a semiconductor wafer Alignment mark for e-beam inspection of a semiconductor wafer

2007-01-30

2007-01-30

Mehta, Bhavesh M. (Department: 2624)

Image analysis

Applications

Manufacturing or product inspection

C257S620000, C257SE23179

Reexamination Certificate

active

10288990

ABSTRACT:
An alignment mark to be used in conjunction with e-beam imaging to identify specific feature locations on a chip including a unique “L” shaped pattern of geometric features, which is easily detected by the recognition system of e-beam imaging equipment, and is located in close proximity to the specific circuit features under investigation at each level to be inspected. The requirements for an alignment mark design which is recognizable by state-of-the-art e-beam imaging systems are enumerated, as well as the methodology for application. The alignment marks which are included at each critical step add no cost to wafer processing, and any design cost is easily overcome by reduction in process development time by using defect learning.

REFERENCES:
patent: 4327292 (1982-04-01), Wang et al.
patent: 4640619 (1987-02-01), Edmark, III
patent: 4642672 (1987-02-01), Kitakata
patent: 4758089 (1988-07-01), Yokokura et al.
patent: 4803644 (1989-02-01), Frazier et al.
patent: 4937618 (1990-06-01), Ayata et al.
patent: 5124927 (1992-06-01), Hopewell et al.
patent: 5405810 (1995-04-01), Mizuno et al.
patent: 5545570 (1996-08-01), Chung et al.
patent: 5570405 (1996-10-01), Chan et al.
patent: 5777392 (1998-07-01), Fujii
patent: 5869383 (1999-02-01), Chien et al.
patent: 6118128 (2000-09-01), Kojima
patent: 6156243 (2000-12-01), Kosuga et al.
patent: 6481003 (2002-11-01), Maeda
patent: 6486954 (2002-11-01), Mieher et al.
patent: 6638831 (2003-10-01), Roberts et al.
patent: 2001/0008442 (2001-07-01), Miyake

Affiliated with

Also associated with

Rating

Alignment mark for e-beam inspection of a semiconductor wafer does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Alignment mark for e-beam inspection of a semiconductor wafer, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Alignment mark for e-beam inspection of a semiconductor wafer will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3763421